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Article
Thermal Resistance at an Interface between a Crystal and its Melt
Journal of Chemical Physics
  • Zhi Liang, Missouri University of Science and Technology
  • William J. Evans
  • Pawel Keblinski
Abstract

Non-Equilibrium Molecular Dynamics Simulations Are Used to Determine Interfacial Thermal Resistance (Kapitza Resistance) between a Crystal and its Melt for Three Materials Including Ar, H2O, and C8H 18 (Octane). the Simulation Results Show that the Kapitza Resistance at a Crystal-Melt Interface is Very Small and Thus Has a Negligible Effect on Thermal Transport Across the Crystal-Melt Interface. the Underlying Origins of This Behavior Are the Very Good Vibrational Property Match between the Two Materials Forming the Interface and Good Interfacial Bonding. the Result Also Indicates that the Commonly-Used Assumption that Temperature Profile is Continuous at the Crystal-Melt Interface is Valid Even in the Case of Very Rapid Crystal Melting or Growth. © 2014 AIP Publishing LLC.

Department(s)
Mechanical and Aerospace Engineering
Document Type
Article - Journal
Document Version
Final Version
File Type
text
Language(s)
English
Rights
© 2023 American Institute of Physics, All rights reserved.
Publication Date
7-7-2014
Publication Date
07 Jul 2014
Citation Information
Zhi Liang, William J. Evans and Pawel Keblinski. "Thermal Resistance at an Interface between a Crystal and its Melt" Journal of Chemical Physics Vol. 141 Iss. 1 (2014) ISSN: 0021-9606
Available at: http://works.bepress.com/zhi-liang/44/