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Article
High quality factor RF inductors using low loss conductor featured with skin effect suppression for standard CMOS/BiCMOS
Proceedings - Electronic Components and Technology Conference
  • I. Iramnaaz, Wright State University - Main Campus
  • T. Sandoval, Wright State University - Main Campus
  • Yan Zhuang, Wright State University - Main Campus
  • H. Schellevis
  • B. Rejaei
Document Type
Conference Proceeding
Publication Date
7-21-2011
Abstract

Integrated on-chip inductors with high quality factors are demonstrated using a low loss artificial conductor technology. This concept is based on an artificial layered meta-material comprising a bi-layered Ni80Fe 20/Cu superlattice. By properly tailoring the thickness ratio between the non-magnetic and magnetic metallic layers, the skin effects can be effectively suppressed within a wide frequency range, and can be tuned to a minimum at the frequency of interest up to 67 GHz. The quality factor has been increased by 41% of a 2nH inductor at 14.5GHz. The bandwidth of skin effect suppression is obtained between 10-18 GHz. © 2011 IEEE.

DOI
10.1109/ECTC.2011.5898508
Citation Information
I. Iramnaaz, T. Sandoval, Yan Zhuang, H. Schellevis, et al.. "High quality factor RF inductors using low loss conductor featured with skin effect suppression for standard CMOS/BiCMOS" Proceedings - Electronic Components and Technology Conference (2011) p. 163 - 168 ISSN: 05695503
Available at: http://works.bepress.com/yan_zhuang/14/