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Article
Effects of Annealing in O2 and N2 on the Microstructure of Metal Organic Chemical Vapor Deposition Ta2O5 Film and the Interfacial SiO2 Layer
Journal of Materials Science: Materials in Electronics
  • Young-Bae Park
  • Xiaodong Li, University of South Carolina - Columbia
  • Gap-Jin Nam
  • Shi-Woo Rhee
Publication Date
4-1-1999
Document Type
Article
Citation Information
Young-Bae Park, Xiaodong Li, Gap-Jin Nam and Shi-Woo Rhee. "Effects of Annealing in O2 and N2 on the Microstructure of Metal Organic Chemical Vapor Deposition Ta2O5 Film and the Interfacial SiO2 Layer" Journal of Materials Science: Materials in Electronics Vol. 10 Iss. 2 (1999) p. 113 - 119
Available at: http://works.bepress.com/xiaodong_li/11/