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Article
Inverse Problems for Metal Oxide Semiconductor Field-Effect Transistor Contact Resistivity
SIAM Journal on Applied Mathematics
  • Weifu Fang, Wright State University - Main Campus
  • Ellis Cumberbatch
Document Type
Article
Publication Date
6-1-1992
Abstract

Inverse problems arising from the identification of transistor contact resistivity and contact window location are studied. A one-point boundary measurement of the potential is shown to be sufficient to identify each from a one-parameter monotone family, and such identification is both stable and continuously dependent on the parameter. For a nonmonotone family of locations with resistivity given, similar results are obtained for measurement made on almost all boundary points.

Comments
Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 International License.
DOI
10.1137/0152039
Citation Information
Weifu Fang and Ellis Cumberbatch. "Inverse Problems for Metal Oxide Semiconductor Field-Effect Transistor Contact Resistivity" SIAM Journal on Applied Mathematics Vol. 52 Iss. 3 (1992) p. 699 - 709 ISSN: 0036-1400
Available at: http://works.bepress.com/weifu_fang/21/