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Selected Works of Vincent Rotello
Article
Polyelectrolyte negative resist patterns as templates for the electrostatic assembly of nanoparticles and electroless deposition of metallic films
Advanced Materials (2008)
  • Y Ofir
  • B Samanta
  • Q Xiao
  • BJ Jordan
  • H Xu
  • P Arumugam
  • R Arvizo
  • MT Tuominen
  • VM Rotello
Abstract

Electron-beam lithography is used to pattern either cationic polyvinyl N-methyl pyridine or anionic sulfonated polystyrene polymers, that act as negative resists, to produce templates for electroless deposition and the electrostatic assembly of metallic, magnetic, or semiconductor nanoparticles.

Disciplines
Publication Date
May 26, 2008
Publisher Statement
DOI: 10.1002/adma.200703095
Citation Information
Y Ofir, B Samanta, Q Xiao, BJ Jordan, et al.. "Polyelectrolyte negative resist patterns as templates for the electrostatic assembly of nanoparticles and electroless deposition of metallic films" Advanced Materials Vol. 20 Iss. 13 (2008)
Available at: http://works.bepress.com/vincent_rotello/41/