"The initial stage of nucleation and growth of Al on H/Si(100)-1x1 by dimethylaluminum hydride vapor deposition" by T. -C. Shen

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The initial stage of nucleation and growth of Al on H/Si(100)-1x1 by dimethylaluminum hydride vapor deposition

Applied Surface Science (1999)

T. -C. Shen, Utah State University
C. Wang
J. R. Tucker

Keywords

nucleation,
vapor deposition

Publication Date

January 1, 1999

Citation Information

T.-C. Shen, C. Wang, and J. R. Tucker,” The initial stage of nucleation and growth of Al on H/Si(100)-1x1 by dimethylaluminum hydride vapor deposition,” Appl. Surf. Sci. 141, 228-236 (1999).