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Microelectronics Process Engineering at San Jose State University: A Manufacturing-Oriented Interdisciplinary Degree Program
International Journal of Engineering Education (2002)
  • Emily Allen, San Jose State University
  • Stacy H. Gleixner, San Jose State University
  • David Parent, San Jose State University
  • Greg Young, San Jose State University
  • Yasser Dessouky, San Jose State University
  • Linda Vanasupa
Abstract

At present, there is a need for engineers with CMOS processing knowledge, statistical process control (SPC) skills, and the ability to work in an interdisciplinary team environment and assume leadership roles. San Jose State University are developing an interdisciplinary lab-based microelectronics process engineering program that introduces SPC and DOE to students in a microelectronics manufacturing environment. At the heart of the program are three courses, each of which is imagined to be a division of a fictitious semiconductor fabrication company (Spartan Semiconductor Services, Inc., or S3i). The divisions are: Digital NMOS division (MatE/EE129: Introduction to IC Fabrication), Thin Film Research Division (MatE/ChE 166: Advanced Thin Film Processes) and CMOS Division and SPC task force (MatE/EE 167: Microelectronics Manufacturing Methods). Several unique features of the program are its introduction of SPC in a microelectronics manufacturing environment, the inclusion of design of experiments (DOE) topics, and the faculty-faculty, faculty-student and student-student interaction among the three courses (divisions). Ultimately, we are trying to provide a learning environment that will allow our students to be immediately productive in an IC production facility, to be able to communicate with IC process engineers, and to be prepared for graduate school programs

Publication Date
2002
Citation Information
Emily Allen, Stacy H. Gleixner, David Parent, Greg Young, et al.. "Microelectronics Process Engineering at San Jose State University: A Manufacturing-Oriented Interdisciplinary Degree Program" International Journal of Engineering Education Vol. 18 Iss. 5 (2002)
Available at: http://works.bepress.com/stacy_gleixner/17/