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Article
Generating random surfaces with desired autocorrelation length
Applied Physics Letters
  • Yilei Zhang, Iowa State University
  • Sriram Sundararajan, Iowa State University
Document Type
Article
Publication Date
1-1-2006
DOI
10.1063/1.2191882
Abstract
A versatile surface processing method based on electrostatic deposition of particles and subsequent dry etching is shown to be able to tailor the autocorrelation length of a random surface by varying particle size and coverage. An explicit relation between final autocorrelation length, surface coverage of the particles, particle size, and etch depth is built. The autocorrelation length of the final surface closely follows a power law decay with particle coverage, the most significant processing parameter. Experimental results on silicon substrates agree reasonably well with model predictions.
Comments

The following article appeared in Applied Physics Letters 88 (2006): 141903, doi:10.1063/1.2191882.

Rights
Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Copyright Owner
American Institute of Physics
Language
en
File Format
application/pdf
Citation Information
Yilei Zhang and Sriram Sundararajan. "Generating random surfaces with desired autocorrelation length" Applied Physics Letters Vol. 88 Iss. 14 (2006) p. 141903
Available at: http://works.bepress.com/sriram_sundararajan/11/