Article
Reducing the Effects of Shot Noise Using Nanoparticles
Chemistry Faculty Publications and Presentations
Document Type
Post-Print
Publication Date
11-1-2014
Subjects
- Nanoparticles -- Optical properties,
- Nanostructured materials -- Technological innovations,
- Semiconductors -- Defects -- Analysis
Disciplines
Abstract
We present a hybrid nano-lithographic approach to minimizes the effects of line edge roughness and shot noise in nano-hole patterning by reflowing photoresist polymers around the nanoparticles deposited using self-assembly and simple etch chemistries. The method extends the transistor contact holes patterning limits to below 20 nm.
DOI
10.1039/C4TC01339E
Persistent Identifier
http://archives.pdx.edu/ds/psu/12950
Citation Information
S. Rananavare and K. M. Morakinyo, J. Mater. Chem. C, 2014, Reducing the Effects of Shot Noise Using Nanoparticles.
This is an Author's Accepted Manuscript of an article published in Journal of Materials Chemistry C and is available online at: http://pubs.rsc.org/en/content/articlelanding/2014/tc/c4tc01339e#!divAbstract