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Article
Application of Optical Emission Diagnostics and Control Related to Semiconductor Processing
SPIE Plasma Processing
  • Richard N. Savage, SC Technology Inc, Livermore, CA
  • Greg C. Viloria, SC Technology Inc, Livermore, CA
Publication Date
1-1-1992
Abstract

This paper discusses and shows applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation is presented. Optical emission spectroscopy techniques discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control, and sputter/deposition plasma monitoring.

Publisher statement
One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Citation Information
Richard N. Savage and Greg C. Viloria. "Application of Optical Emission Diagnostics and Control Related to Semiconductor Processing" SPIE Plasma Processing Vol. 1594 (1992) p. 388 - 400
Available at: http://works.bepress.com/rsavage/28/