Application of Optical Emission Diagnostics and Control Related to Semiconductor ProcessingSPIE Plasma Processing
AbstractThis paper discusses and shows applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation is presented. Optical emission spectroscopy techniques discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control, and sputter/deposition plasma monitoring.
Copyright1991 Society of Photo-Optical Instrumentation Engineers.
Citation InformationRichard N. Savage and Greg C. Viloria. "Application of Optical Emission Diagnostics and Control Related to Semiconductor Processing" SPIE Plasma Processing Vol. 1594 (1992) p. 388 - 400
Available at: http://works.bepress.com/rsavage/28/