Skip to main content
Article
Selective Placement of DNA Origami on Substrates Patterned by Nanoimprint Lithography
Journal of Vacuum Science and Technology B
  • Erika Penzo
  • Risheng Wang, Missouri University of Science and Technology
  • Matteo Palma
  • Shalom J. Wind
Abstract

Self-assembled DNAnanostructures can be used as scaffolds to organize small functional nanocomponents. in order to build working devices -- electronic circuits, biochips, optical/photonics devices -- controlled placement of DNAnanostructures on substrates must be achieved. Here we present a nanoimprint lithography-based process to create chemically patterned templates, rendering them capable of selectively binding DNA origami. Hexamethyldisilazane (HMDS) is used as a passivating layer on silicon dioxide substrates, which prevents DNA attachment. Hydrophilic areas, patterned by nanoimprint lithography with the same size and shape of the origami, are formed by selective removal of the HMDS, enabling the assembly of the origami scaffolds in the patterned areas. the use of nanoimprint lithography, a low cost, high throughput patterning technique, enables high precision positioning and orientation of DNAnanostructures on a surface over large areas.

Department(s)
Chemistry
Keywords and Phrases
  • Bioassay,
  • Biochips,
  • DNA,
  • Nanostructures,
  • Scaffolds,
  • Silica,
  • Hexamethyldisilazane,
  • High Precision Positioning,
  • High Throughput,
  • Low Costs,
  • Nano-imprint,
  • Passivating Layer,
  • Patterning Techniques,
  • Selective Removal,
  • Self-assembled DNA,
  • Silicondioxide Substrates,
  • Size And Shape,
  • Nanoimprint Lithography
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2011 American Vacuum Society, All rights reserved.
Publication Date
11-1-2011
Disciplines
Citation Information
Erika Penzo, Risheng Wang, Matteo Palma and Shalom J. Wind. "Selective Placement of DNA Origami on Substrates Patterned by Nanoimprint Lithography" Journal of Vacuum Science and Technology B Vol. 29 Iss. 6 (2011) ISSN: 2166-2746
Available at: http://works.bepress.com/risheng-wang/12/