Article
Mold cleaning with polydimethylsiloxane (PDMS) for nanoimprint lithography
Nanotechnology
(2013)
Abstract
We present a simple and effective mold cleaning method for nanoimprint lithography. Polydimethylsiloxane (PDMS) prepolymer is spin-coated onto a contaminated imprint mold, thermally cured in an ambient environment, and then peeled off afterwards. Contaminants of 100 s μm to sub-50 nm sizes are effectively cleaned within one cycle. During the cleaning process, a very thin PDMS film (1–2 nm) is uniformly coated onto the mold surface, serving as a protection and anti-sticking layer.
Disciplines
Publication Date
2013
Publisher Statement
doi:10.1088/0957-4484/24/32/325301
The published version is located at http://iopscience.iop.org/0957-4484/24/32/325301
Citation Information
Peng Lin, Shuang Pi, Jiang Jiang and Qiangfei Xia. "Mold cleaning with polydimethylsiloxane (PDMS) for nanoimprint lithography" Nanotechnology Vol. 24 Iss. 325301 (2013) Available at: http://works.bepress.com/qiangfei_xia/11/