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Nanometrology Device Standards for Scanning Probe Mmicroscopes and Processes for Their Fabrication and Use
Physics Faculty Publications and Presentations
  • Peter Moeck, Portland State University
Document Type
Publication Date
  • Scanning probe microscopy -- Data processing,
  • Metrology -- Standards,
  • Image processing,
  • Crystals -- Structure
Nanometrology device standards and methods for fabricating and using such devices in conjunction With scanning probe microscopes are described. The fabrication methods comprise: (1) epitaxial growth that produces nanometer sized islands of knoWn morphology, structural, morphological and chemical stability in typical nanometrology environments, and large height-to-width nano-island aspect ratios, and (2) marking suitable crystallographic directions on the device for alignment With a scanning direction.

Patent number: US 7,472.576 B1

Persistent Identifier
Citation Information
Moeck, Peter. "Nanometrology device standards for scanning probe microscopes and processes for their fabrication and use." U.S. Patent No. 7,472,576. 6 Jan. 2009.