Photolithographic patterning of vacuum-deposited organic light emitting devicesApplied Physics Letters (1997)
AbstractWe demonstrate a photolithographic technique to fabricate vacuum-deposited organic light emitting devices. Photoresist liftoff combined with vertical deposition of the emissive organic materials and the metal cathode, followed by oblique deposition of a metal cap, avoids the use of high processing temperatures and the exposure of the organic materials to chemical degradation. The unpackaged devices show no sign of deterioration in room ambient when compared with conventional devices fabricated using low-resolution, shadow mask patterning. Furthermore, the devices are resistant to rapid degradation when operated in air for extended periods. This work illustrates a potential foundation for the volume production of very high-resolution, full color, flat panel displays based on small molecular weight organic light emitting devices.
Publication DateDecember 1, 1997
Citation InformationPeifang Tian, P. E. Burrows and S. E. Forrest. "Photolithographic patterning of vacuum-deposited organic light emitting devices" Applied Physics Letters Vol. 71 Iss. 22 (1997)
Available at: http://works.bepress.com/peifang_tian/1/