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Enhancement of Ferroelectric Polarization Stability by Interface Engineering
Advanced Materials (2012)
  • H. Lu, University of Nebraska - Lincoln
  • X. Liu, University of Nebraska - Lincoln
  • J. D. Burton, University of Nebraska - Lincoln
  • C. W. Bark, University of Wisconsin - Madison
  • Y. Wang, University of Nebraska - Lincoln
  • Y. Zhang, University of Michigan-Ann Arbor
  • D. J. Kim, University of Nebraska - Lincoln
  • A. Stamm, University of Nebraska - Lincoln
  • Pavel Lukashev, University of Northern Iowa
  • D. A. Felker, University of Wisconsin - Madison
  • C. M. Folkman, University of Wisconsin - Madison
  • P. Gao, University of Michigan - Ann Arbor
  • M. S. Rzchowski, University of Wisconsin - Madison
  • X. Q. Pan, University of Michigan - Ann Arbor
  • C. B. Eom, University of Wisconsin - Madison
  • E. Y. Tsymbal, University of Nebraska - Lincoln
  • A. Gruverman, University of Nebraska - Lincoln
Abstract
By using theoretical predictions based on first-principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.
Disciplines
Publication Date
January 26, 2012
DOI
10.1002/adma.201104398
Citation Information
H. Lu, X. Liu, J. D. Burton, C. W. Bark, et al.. "Enhancement of Ferroelectric Polarization Stability by Interface Engineering" Advanced Materials Vol. 24 Iss. 12 (2012)
Available at: http://works.bepress.com/pavel-lukashev/9/