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Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide
Industrial and Engineering Chemistry Research
  • Ye Jinaco
  • Michael A Matthews, University of South Carolina - Columbia
  • Charles H. Darvin
Publication Date
10-30-2001
Document Type
Article
Rights

©Industrial and Engineering Chemistry Research 2001, American Chemical Society.

Jinaco, Y., Matthews, M. A., & Darvin, C. H. (2001). Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide. Industrial and Engineering Chemistry Research, 40 (24), 5858-5860. http://dx.doi.org/10.1021/ie010424h

Citation Information
Ye Jinaco, Michael A Matthews and Charles H. Darvin. "Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide" Industrial and Engineering Chemistry Research Vol. 40 Iss. 24 (2001) p. 5858 - 5860
Available at: http://works.bepress.com/michael-matthews/74/