Article
Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide
Industrial and Engineering Chemistry Research
Publication Date
10-30-2001
Document Type
Article
Disciplines
Rights
©Industrial and Engineering Chemistry Research 2001, American Chemical Society.
Jinaco, Y., Matthews, M. A., & Darvin, C. H. (2001). Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide. Industrial and Engineering Chemistry Research, 40 (24), 5858-5860. http://dx.doi.org/10.1021/ie010424h
Citation Information
Ye Jinaco, Michael A Matthews and Charles H. Darvin. "Prevention of Photoresist Pattern Collapse by Using Liquid Carbon Dioxide" Industrial and Engineering Chemistry Research Vol. 40 Iss. 24 (2001) p. 5858 - 5860 Available at: http://works.bepress.com/michael-matthews/74/