"Formation of arsenic rich silicon oxide under plasma immersion ion implantation and laser annealing" by F. Meirer

Article

Formation of arsenic rich silicon oxide under plasma immersion ion implantation and laser annealing

ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology (2012)

F. Meirer
E. Demenev
D. Giubertoni
S. Gennaro
L. Vanzetti
G. Pepponi
M. Bersani
M. A. Sahiner
G. Steinhauser
M. A. Foad
J. C. Woicik
A. Mehta
P. Pianetta

Link

Disciplines

Materials Science and Engineering,
Radiochemistry and
Analytical Chemistry

Publication Date

January 1, 2012

DOI

10.1063/1.4766520

Citation Information

F. Meirer, E. Demenev, D. Giubertoni, S. Gennaro, et al.. "Formation of arsenic rich silicon oxide under plasma immersion ion implantation and laser annealing" ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology Vol. 1496 Iss. 1 (2012) p. 183 - 188
Available at: http://works.bepress.com/mehmet_sahiner/23/