"Local structural modifications of the HfO2 layer in the Al2O3 capped high‐k dielectric films as probed by EXAFS" by M. A. Sahiner

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Local structural modifications of the HfO2 layer in the Al2O3 capped high‐k dielectric films as probed by EXAFS

Physica Status Solidi (a) (2012)

M. A. Sahiner, Seton Hall University
P. S. Lysaght, SEMATECH
J. C. Woicik, National Institute of Standards and Technology
C. S. Park, SEMATECH
J. Huang, SEMATECH
G. Bersuker, SEMATECH
W. Taylor, SEMATECH
P. D. Kirsch, SEMATECH
R. Jammy, SEMATECH

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Disciplines

Atomic, Molecular and Optical Physics,
Physics and
Analytical Chemistry

Publication Date

April 1, 2012

DOI

10.1002/pssa.201100669

Citation Information

M. A. Sahiner, P. S. Lysaght, J. C. Woicik, C. S. Park, et al.. "Local structural modifications of the HfO2 layer in the Al2O3 capped high‐k dielectric films as probed by EXAFS" Physica Status Solidi (a) Vol. 209 Iss. 4 (2012) p. 679 - 682
Available at: http://works.bepress.com/mehmet_sahiner/22/