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Presentation
Sequence effects on multiblock polymer morphology
American Chemical Society 252nd National Meeting (2016)
  • Madalyn R. Radlauer, University of Minnesota - Twin Cities
  • Christophe Sinturel, Université d’Orléans
  • Yusuke Asai, Nagoya University
  • Megan E. Matta, University of Minnesota - Twin Cities
  • Joshua Van Benschoten, University of Minnesota - Twin Cities
  • Marc A. Hillmyer, University of Minnesota - Twin Cities
Abstract
Poly(isoprene) (PI) and poly(lactide) (PLA) are significantly more incompatible with each other than either is with poly(styrene) (PS). Thus, when the sequence of blocks within a multiblock terpolymer of PS, PI, and PLA forces a covalent connection between PI and PLA, the polymer is considered to be frustrated because the most incompatible blocks are covalently linked. This frustration can lead to the formation of complex morphologies in both bulk and thin films that are not obtained when the sequence is altered to remove the covalent linkage between PI and PLA. The thin film morphologies are especially intriguing in this type of system because the effect of frustration can be magnified by confinement and interfacial interactions. As an example, in PS-block-PI-block-PLA thin films with equal volume fractions of each block, the PI midblock domains were discontinuous, favoring PS/PLA contacts over PI/PLA contacts.
Disciplines
Publication Date
August, 2016
Location
Philadelphia, PA
Citation Information
Madalyn R. Radlauer, Christophe Sinturel, Yusuke Asai, Megan E. Matta, et al.. "Sequence effects on multiblock polymer morphology" American Chemical Society 252nd National Meeting (2016)
Available at: http://works.bepress.com/madalyn-radlauer/15/