Presentation
Electrochemical Pitting And Repassivation On Icosahedral AL-CU-FE, And A Comparison With Crystalline Phases
Ames Laboratory Conference Papers, Posters, and Presentations
Document Type
Conference Proceeding
Conference
Quasicrystals: Proceedings of the MRS 1998 Fall Meeting
Publication Date
1-1-1999
DOI
10.1557/PROC-553-275
Geolocation
(40.65320759999999, -80.07949250000001)
Abstract
We report the electrochemical potentials at which localized pitting and repassivation occur on icosahedral Al-Cu-Fe, and on a series of related alloys and elemental metals. The electrochemistry occurs in a buffered NaCI solution, pH 8.4. Under these conditions, pitting and repassivation appear to be controlled mainly by the chemical composition of the alloy, although the quasicrystalline phase displays an anomalous resistance to repassivation. Corrosion of this phase proceeds by dissolution of Al and Fe, leaving behind pits which are Cu-enriched.
Copyright Owner
Materials Research Society
Copyright Date
1999
Language
en
Citation Information
Nicholas A Spurr, Patrick J. Pinhero, Daniel J. Sordelet, Kurt R. Hebert, et al.. "Electrochemical Pitting And Repassivation On Icosahedral AL-CU-FE, And A Comparison With Crystalline Phases" Warrendale, PA(1999) Available at: http://works.bepress.com/kurtr_hebert/43/
This article is from Quasicrystals: Proceedings of the MRS 1998 Fall Meeting 553 (1999): pp. 275—280, doi:10.1557/PROC-553-275