Article
The stoichiometry of metal assisted etching (MAE) of Si in V2O5 + HF and HOOH + HF solutions
Electrochimica Acta
Document Type
Article
Publication Date
2-6-2015
Disciplines
Publisher
Elsevier
DOI
10.1016/j.electacta.2015.01.162
Citation Information
Kurt W. Kolasinski, William B. Barclay, Yu Sun and Mark Aindow. "The stoichiometry of metal assisted etching (MAE) of Si in V2O5 + HF and HOOH + HF solutions" Electrochimica Acta (2015) p. 219 - 228 ISSN: 0013-4686 Available at: http://works.bepress.com/kurt_kolasinski/11/