"The stoichiometry of metal assisted etching (MAE) of Si in V2O5 + HF and HOOH + HF solutions" by Kurt W. Kolasinski

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The stoichiometry of metal assisted etching (MAE) of Si in V2O5 + HF and HOOH + HF solutions

Electrochimica Acta

Kurt W. Kolasinski, West Chester University of Pennsylvania
William B. Barclay, West Chester University of Pennsylvania
Yu Sun, University of Connecticut - Storrs
Mark Aindow, University of Connecticut - Storrs

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Document Type

Article

Publication Date

2-6-2015

Disciplines

Materials Chemistry

Publisher

Elsevier

DOI

10.1016/j.electacta.2015.01.162

Citation Information

Kurt W. Kolasinski, William B. Barclay, Yu Sun and Mark Aindow. "The stoichiometry of metal assisted etching (MAE) of Si in V2O5 + HF and HOOH + HF solutions" Electrochimica Acta (2015) p. 219 - 228 ISSN: 0013-4686
Available at: http://works.bepress.com/kurt_kolasinski/11/