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Article
Pattern Stabilization through Parameter Alternation in a Nonlinear Optical System
Physical Review Letters
  • John P. Sharpe, California Polytechnic State University - San Luis Obispo
  • P. L. Ramazza, Instituto Nazionale di Ottica - Florence, Italy
  • Nilgun Sungar, California Polytechnic State University - San Luis Obispo
  • Karl Saunders, California Polytechnic State University - San Luis Obispo
Publication Date
3-8-2006
Abstract

We report the first experimental realization of pattern formation in a spatially extended nonlinear system when the system is alternated between two states, neither of which exhibits patterning. Dynamical equations modeling the system are used for both numerical simulations and a weakly nonlinear analysis of the patterned states. The simulations show excellent agreement with the experiment. The nonlinear analysis provides an explanation of the patterning under alternation and accurately predicts both the observed dependence of the patterning on the frequency of alternation and the measured spatial frequencies of the patterns.

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Publisher statement
This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Physical Society. The following article appeared in Physical Review Letters.
Citation Information
John P. Sharpe, P. L. Ramazza, Nilgun Sungar and Karl Saunders. "Pattern Stabilization through Parameter Alternation in a Nonlinear Optical System" Physical Review Letters Vol. 96 Iss. 9 (2006) p. 094101.1 - 094101.4
Available at: http://works.bepress.com/ksaunder/10/