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Fabrication of Photonic Band Gap Material
(2002)
Abstract
A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microspheres, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microspheres therefrom. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microspheres may be polystyrene microspheres.
Disciplines
Publication Date
January 15, 2002
Comments
This is a patent filed on January 5, 2000. Publication number US6339030 B1. Application number: 09/477,191. Assignee: The United States of America as represented by the United States Department of Energy, Washington, DC (US)
Citation Information
Kristen P. Constant, Ganapathi S. Subramania, Rana Biswas and Kai-Ming Ho. "Fabrication of Photonic Band Gap Material" (2002) Available at: http://works.bepress.com/kristen_constant/33/