Article
Fabrication of submicron metallic grids with interference and phase-mask holography
Journal of Micro/Nanolithography, MEMS, and MOEMS
Document Type
Article
Disciplines
Publication Date
1-25-2011
DOI
10.1117/1.3541794
Abstract
Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
Rights
Copyright 2011 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Copyright Owner
SPIE
Copyright Date
2011
Language
en
File Format
application/pdf
Citation Information
Joong Mok Park, Tae Geun Kim, Kristen P. Constant and Kai-Ming Ho. "Fabrication of submicron metallic grids with interference and phase-mask holography" Journal of Micro/Nanolithography, MEMS, and MOEMS Vol. 10 Iss. 1 (2011) p. 013011 Available at: http://works.bepress.com/kristen_constant/12/
This article is from Journal of Micro/Nanolithography, MEMS, and MOEMS 10 (2011): 013011, doi:10.1117/1.3541794. Posted with permission.