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Article
An Investigation of Amorphous Ge2Se3 Structure for Phase Change Memory Devices Using Fluctuation Electron Microscopy
Journal of Applied Physics
  • K. Jarvis, Arizona State University
  • R. W. Carpenter, Arizona State University
  • M. Davis, Boise State University
  • Kristy A. Campbell, Boise State University
Document Type
Article
Publication Date
10-15-2009
DOI
http://dx.doi.org/10.1063/1.3225566
Abstract

Medium range order in amorphous thin films of Ge2Se3, a phase change memory material, was examined using electron nanodiffraction fluctuation electron microscopy. Variance measurements showed that medium range order existed at 0.36 and 0.58 Å−1. The film was not at equilibrium and contained a few monoclinic nanocrystals with weak Bragg maxima at 0.33, 0.54, and 0.63 Å−1, which are related to the GeSe2 equilibrium phase at this composition. We also determined the variance for amorphous silicon (a-Si) and amorphous silica (a-SiO2) and those results agree with others in the literature. It is expected that the medium range order is related to nucleation of the crystallization reaction in Ge2Se3.

Citation Information
K. Jarvis, R. W. Carpenter, M. Davis and Kristy A. Campbell. "An Investigation of Amorphous Ge2Se3 Structure for Phase Change Memory Devices Using Fluctuation Electron Microscopy" Journal of Applied Physics (2009)
Available at: http://works.bepress.com/kris_campbell/29/