Fabrication of Carbon Nanotube-Based Nanodevices Using a Combination Technique of Focused Ion Beam and Plasma-Enhanced Chemical Vapor DepositionApplied Physics Letters
SponsorFinancial support for this research was provided in part by the National Science Foundation under Award Nos. ECS-0348277, ECS-0520891, and DMR-0649280.
- Nanoelectromechanical systems,
- Transmission electron microscopy,
- Focused ion beams
AbstractThis study focuses on the fabrication of two nanodevice prototypes which utilized vertical and horizontal carbon nanotubes used the focused ion beam to localize the catalysts, followed by plasma-enhanced chemical vapor deposition. First, metal-gated carbon nanotube field emitter arrays were fabricated on multilayer substrates containing an imbedded catalyst layer. Second, horizontally aligned single-walled carbon nanotubes were grown on a transmission electron microscopy grid. This allows the carbon nanotubes to be directly analyzed in a transmission electron microscope. It is expected that the methodology introduced here will open up opportunities for the direct fabrication of carbon nanotube based nanodevices.
Citation InformationWu, J., Eastman, M., Gutu, T., Wyse, M., Jiao, J., Kim, S. M., ... Teo, K. B. K. (2007). Fabrication of carbon nanotube-based nanodevices using a combination technique of focused ion beam and plasma-enhanced chemical vapor deposition. [Article]. Applied Physics Letters, 91(17),