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Article
Fabrication of Carbon Nanotube-Based Nanodevices Using a Combination Technique of Focused Ion Beam and Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
  • Jianfeng Wu, Portland State University
  • Micah Eastman, Portland State University
  • Timothy Gutu, Portland State University
  • Madeline Wyse, Portland State University
  • Jun Jiao, Portland State University
  • S.-M. Kim, University of Cambridge
  • M. Mann, University of Cambridge
  • Y. Zhang, University of Cambridge
  • K. B. Teo, University of Cambridge
Document Type
Article
Publication Date
1-1-2007
Subjects
  • Nanotubes,
  • Nanoelectromechanical systems,
  • Transmission electron microscopy,
  • Focused ion beams
Disciplines
Abstract
This study focuses on the fabrication of two nanodevice prototypes which utilized vertical and horizontal carbon nanotubes used the focused ion beam to localize the catalysts, followed by plasma-enhanced chemical vapor deposition. First, metal-gated carbon nanotube field emitter arrays were fabricated on multilayer substrates containing an imbedded catalyst layer. Second, horizontally aligned single-walled carbon nanotubes were grown on a transmission electron microscopy grid. This allows the carbon nanotubes to be directly analyzed in a transmission electron microscope. It is expected that the methodology introduced here will open up opportunities for the direct fabrication of carbon nanotube based nanodevices.
Description

© 2007 AIP Publishing LLC. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Applied Physics Letters and may be found at: http://dx.doi.org/10.1063/1.2802552

DOI
10.1063/1.2802552
Persistent Identifier
http://archives.pdx.edu/ds/psu/7318
Citation Information
Wu, J., Eastman, M., Gutu, T., Wyse, M., Jiao, J., Kim, S. M., ... Teo, K. B. K. (2007). Fabrication of carbon nanotube-based nanodevices using a combination technique of focused ion beam and plasma-enhanced chemical vapor deposition. [Article]. Applied Physics Letters, 91(17),