Studies of secondary and backscattered electron yield curves of thin-film dielectrics have recently been made using pulsed, low current electron beam methods to minimize insulator charging. These capabilities have allowed us to investigate the evolution of surface and internal charge profiles as a function of low energy electron (keV) pulsed-electron fluence to determine how quickly insulators charge, and how this can affect subsequent electron emission properties. We have also studied critical incident electron energies that result in electrical breakdown of insulator materials and the effect of breakdown on subsequent emission, charging and conduction. The qualitative physics of such processes in solid dielectrics has long been known; this work begins to place such studies on a quantitative basis.