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Arbitrary Photopatterning in Liquid Crystal Alignments using DMD Based Lithography System
Optics Express
  • Hao Wu
  • Wei Hu
  • Xiao-wen Lin
  • Ge Zhu
  • Jae-Won Choi, University of Akron, main campus
  • Vladimir Chigrinov
  • Yan-qing Lu
Document Type
Article
Publication Date
1-1-2012
Abstract

We propose and implement a technique for arbitrary pattern fabrication in liquid crystal (LC) alignments and local polarization control for light wavefront. A micro-lithography system with a digital micro-mirror device as dynamic mask forms arbitrary micro-images on photoalignment layers and further guides the LC molecule orientations. Besides normal phase gratings, more complex 2D patterns such as quasicrystal and checkerboard structures are demonstrated. To characterize the optical performances of the fabricated structures, the electro-optically tunable diffraction patterns and efficiencies are demonstrated in several 1D/2D phase gratings. Compared to other techniques, our method enables the arbitrary and instant manipulation of LC alignments and light polarization states, facilitating wide applications in display and photonic fields.

Citation Information
Hao Wu, Wei Hu, Xiao-wen Lin, Ge Zhu, et al.. "Arbitrary Photopatterning in Liquid Crystal Alignments using DMD Based Lithography System" Optics Express Vol. 20 Iss. 15 (2012) p. 16684 - 16689
Available at: http://works.bepress.com/jae-won_choi/3/