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Article
Effect of Thin Film Confined Between Two Dissimilar Solids on Interfacial Thermal Resistance
Journal of Physics Condensed Matter
  • Z. Liang
  • Hai-Lung Tsai, Missouri University of Science and Technology
Abstract

A non-equilibrium molecular dynamics model is developed to investigate how a thin film confined between two dissimilar solids affects the thermal transport across the material interface. For two highly dissimilar (phonon frequency mismatched) solids, it is found that the insertion of a thin film between them can greatly enhance thermal transport across the material interface by a factor of 2.3 if the thin film has one of the following characteristics: (1)a multi-atom-thick thin film of which the phonon density of states (DOS) bridges the two different phonon DOSs for the solid on each side of the thin film; (2)a single-atom-thick film which is weakly bonded to the solid on both sides of the thin film. The enhanced thermal transport in the single-atom-thick film case is found mainly due to the increased inelastic scattering of phonons by the atoms in the film. However, for solid-solid interfaces with a relatively small difference in the phonon DOS, it is found that the insertion of a thin film may decrease the thermal transport. © 2011 IOP Publishing Ltd.

Department(s)
Mechanical and Aerospace Engineering
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2011 Institute of Physics - IOP Publishing, All rights reserved.
Publication Date
1-1-2011
Publication Date
01 Jan 2011
Citation Information
Z. Liang and Hai-Lung Tsai. "Effect of Thin Film Confined Between Two Dissimilar Solids on Interfacial Thermal Resistance" Journal of Physics Condensed Matter (2011)
Available at: http://works.bepress.com/hai-lung-tsai/59/