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Article
Through-Silicon Via Capacitance-Voltage Hysteresis Modeling for 2.5-D and 3-D IC
IEEE Transactions on Components, Packaging and Manufacturing Technology
  • DongHyun Kim, Missouri University of Science and Technology
  • Yongwoo Kim
  • Jonghyun Cho
  • For full list of authors, see publisher's website., For full list of authors, see publisher's website.
Abstract

We propose, for the first time, an explicit semiconductor physics-based through-silicon via (TSV) capacitance-voltage (CV) model. The effect of TSV CV hysteresis is demonstrated in the model, and the TSV capacitance is modeled with respect to dc bias voltage and the dimension of the TSV. The proposed model is verified by comparison to the measurement results. The effect of hysteresis in the model correlates well with the measurement results. This model can be utilized in a circuit level simulation to expand the possible application of the model to, but not limited to, hierarchical power distribution network impedance analysis, RC delay analysis, input-output power consumption analysis, and crosstalk and eye diagram simulation in any 3-D-IC systems using TSVs.

Department(s)
Electrical and Computer Engineering
Research Center/Lab(s)
Electromagnetic Compatibility (EMC) Laboratory
Keywords and Phrases
  • Through-silicon via (TSV) technology,
  • TSV capacitance-voltage (CV) hysteresis,
  • TSV CV model
Document Type
Article - Journal
Document Version
Citation
File Type
text
Language(s)
English
Rights
© 2017 Institute of Electrical and Electronics Engineers (IEEE), All rights reserved.
Publication Date
6-1-2017
Publication Date
01 Jun 2017
Citation Information
DongHyun Kim, Yongwoo Kim, Jonghyun Cho and For full list of authors, see publisher's website.. "Through-Silicon Via Capacitance-Voltage Hysteresis Modeling for 2.5-D and 3-D IC" IEEE Transactions on Components, Packaging and Manufacturing Technology Vol. 7 Iss. 6 (2017) p. 925 - 935 ISSN: 2156-3950
Available at: http://works.bepress.com/donghyun-bill-kim/45/