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Electron Injection by Dephasing Electrons with Laser Fields
Donald Umstadter Publications
  • E. Dodd, Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, MI
  • J.K. Kim, Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, MI
  • Donald P. Umstadter, University of Nebraska-Lincoln
Date of this Version
11-20-1999
Disciplines
Comments

Advanced Accelerator Concepts: Eighth Workshop, W. Lawson, C. Bellamy, and D. Brosius, AIP Conference Proceedings (AIP Press, New York, 1999),vol. 472 p. 886. Copyright 1999. Permission to use.

Abstract
The authors seek to review injection concepts for plasma based acceleration. It is shown that regardless of injection mechanism, resultant beams will be similar due to wave structure. Also, most schemes employ the same basic processes, namely the dephasing of electrons by laser fields, and can thus be analyzed with similar approaches.
Citation Information
E. Dodd, J.K. Kim and Donald P. Umstadter. "Electron Injection by Dephasing Electrons with Laser Fields" (1999)
Available at: http://works.bepress.com/donald_umstadter/59/