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Temporal Contrast in Ti:Sapphire Lasers: Characterization and Control
Donald Umstadter Publications
  • Marc Nantel, University of Michigan - Ann Arbor
  • Jiro Itatani, University of Tokyo, Minato-ku, Tokyo
  • An-Chun Tien, University of Michigan - Ann Arbor
  • Jerome Faure, University of Michigan - Ann Arbor
  • Daniel Kaplan, Alliage Inc., 75005 Paris, France
  • Marcel Bouvier, Medox Electro-Optics Inc., Ann Arbor, MI
  • Takashi Buma, University of Michigan - Ann Arbor
  • Paul Van Rompay, University of Michigan - Ann Arbor
  • John Nees, University of Michigan - Ann Arbor
  • Peter P. Pronko, University of Michigan - Ann Arbor
  • Donald P. Umstadter, University of Nebraska-Lincoln
  • Gerald A. Mourou, University of Michigan - Ann Arbor
Date of this Version
3-1-1998
Disciplines
Comments

IEEE Journal Selected Topics Quantum Electronics 4, 449-458 (1998). Copyright 1998. Permission to use.

Abstract
As ultrafast lasers achieve ever higher focused intensities on target, the problem of ensuring a clean laser-solid interaction becomes more pressing. In this paper, we give concrete examples of the deleterious effects of low-contrast interactions, and address the problem of subpicosecond laser intensity contrast ratio on both characterization and control fronts. We present the new technique of high-dynamic-range plasma-shuttered streak camera contrast measurement, as well as two efficient and relatively inexpensive ways of improving the contrast of short pulse lasers without sacrificing on the output energy: a double-pass Pockels cell (PC), and clean high-energy-pulse seeding of the regenerative amplifier.
Citation Information
Marc Nantel, Jiro Itatani, An-Chun Tien, Jerome Faure, et al.. "Temporal Contrast in Ti:Sapphire Lasers: Characterization and Control" (1998)
Available at: http://works.bepress.com/donald_umstadter/46/