Lithography on GaP(100) surfacesBirck and NCN Publications
AbstractTwo types of lithographic methods were used to modify GaP(1 00) surfaces with commercially available alkanethiol molecules: microcontact printing (mu CP) and "dip-pen" nanolithography (DPN), The patterned surfaces were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS). The characterization was done in order to understand the quality of each type of pattern, its chemical composition, and the organization of the molecules on the surface. Differences between the two lithographic methods used to do lithography on the GaP(1 00) in this study were dependent on the chosen molecular "ink".
- DIP-PEN NANOLITHOGRAPHY; ALKANETHIOL MONOLAYERS; SEMICONDUCTOR SURFACES; GAAS-SURFACES; X-RAY; MOLECULES; PEPTIDES; XPS; SPECTROSCOPY; GAAS(001)
Date of this Version6-1-2008
CitationSurface Science 602 (2008) 1993–1998
Citation InformationRosangelly Flores-Perez, Dmitry Zemlyanov and Albena Ivanisevic. "Lithography on GaP(100) surfaces" (2008)
Available at: http://works.bepress.com/dmitry_zemlyanov/7/