Skip to main content
Electromechanically Driven Chaotic Dynamics of Voids in Metallic Thin Films
Physical Review B (2010)
  • Dimitrios Maroudas, University of Massachusetts - Amherst
  • M. R Gungor
  • V. Tomar

We report a systematic investigation of complex asymptotic states reached in the electromigration-driven morphological evolution of void surfaces in thin films of face-centered cubic metals with ⟨110⟩- and ⟨100⟩-oriented film planes under the simultaneous action of biaxial tension. The analysis is based on self-consistent dynamical simulations according to a realistic, well-validated, and fully nonlinear model. For ⟨110⟩-oriented film planes, we show that upon increasing the applied mechanical stress level, morphologically stable steady states transition to time-periodic states through a subcritical Hopf bifurcation. Further increase in the stress level triggers a sequence of period-doubling bifurcations that sets the driven nonlinear system on a route to chaos. For ⟨100⟩-oriented film planes, a transition from steady to time-periodic states also is found to occur at a critical stress level; in this case, the corresponding Hopf bifurcation is supercritical and the nonlinear system is not set on a route to chaos.

Publication Date
Publisher Statement
Copyright 2010 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Citation Information
Dimitrios Maroudas, M. R Gungor and V. Tomar. "Electromechanically Driven Chaotic Dynamics of Voids in Metallic Thin Films" Physical Review B Vol. 81 Iss. 5 (2010)
Available at: