Article
Characterization of Homoepitaxial p-Type ZnO Grown by Molecular Beam Epitaxy
Applied Physics Letters
Document Type
Article
Publication Date
9-1-2002
Disciplines
Abstract
An N-doped, p-type ZnO layer has been grown by molecular beam epitaxy on an Li-diffused, bulk, semi-insulating ZnO substrate. Hall-effect and conductivity measurements on the layer give: resistivity = 4×101 Ω cm; hole mobility = 2 cm2/V s; and hole concentration = 9×1016 cm−3. Photoluminescence measurements in this N-doped layer show a much stronger peak near 3.32 eV (probably due to neutral acceptor bound excitons), than at 3.36 eV (neutral donor bound excitons), whereas the opposite is true in undoped ZnO. Calibrated, secondary-ion mass spectroscopy measurements show an N surface concentration of about 1019 cm−3 in the N-doped sample, but only about 1017 cm−3 in the undoped sample.
DOI
10.1063/1.1504875
Citation Information
David C. Look, D. C. Reynolds, C. W. Litton, R. L. Jones, et al.. "Characterization of Homoepitaxial p-Type ZnO Grown by Molecular Beam Epitaxy" Applied Physics Letters Vol. 81 Iss. 10 (2002) p. 1830 - 1832 ISSN: 0003-6951 Available at: http://works.bepress.com/david_look/5/
Copyright © 2002, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters 81.10, and may be found at http://apl.aip.org/resource/1/applab/v81/i10/p1830_s1