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Article
Type Conversion in Electron‐Irradiated GaAs
Journal of Applied Physics
  • J. W. Farmer
  • David C. Look, Wright State University - Main Campus
Document Type
Article
Publication Date
4-1-1979
Abstract

The unambiguous type conversion of GaAs by electron irradiation is reported here for the first time. Several high‐quality n‐type vapor‐phase epitaxial layers (ρ?3 Ω cm and μ?7000 cm2/V sec at 300 K) were converted by 1‐MeV electrons to high‐quality p‐type layers (ρ?30 Ω cm and μ?400 cm2/V sec). Temperature‐dependent Hall‐effect data show energy levels at 0.5, 0.3, and about 0.1 eV above the valence band. Evidence is presented to indicate that the failure of some of our samples (and, perhaps, other samples reported in the literature) to convert to lowresistivity p type is due to a rather high concentration of as‐grown deep levels which pin the Fermi level near midgap.

Comments

Copyright © 1979, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in the Journal of Applied Physics 50.4, and may be found at http://dx.doi.org/10.1063/1.326177.

DOI
10.1063/1.326177
Citation Information
J. W. Farmer and David C. Look. "Type Conversion in Electron‐Irradiated GaAs" Journal of Applied Physics Vol. 50 Iss. 4 (1979) p. 2970 - 2972 ISSN: 0021-8979
Available at: http://works.bepress.com/david_look/423/