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ZnO/AlGaN Ultraviolet Light Emitting Diodes
MRS Proceedings
Document Type
Conference Proceeding
Publication Date
4-1-2004
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Abstract
Ga doped n-type ZnO layers are grown using plasma assisted chemical vapor deposition on Mg doped p-type AlGaN epitaxial layers grown by hydride vapor phase epitaxy to form n-ZnO/p-AlGaN heterojunction light emitting diodes. I-V characteristics clearly show rectifying behavior with a threshold voltage of ∼3.2 V and intense ultraviolet electroluminescence with peak emission at 390 nm. The dominant emission mechanism is found to result from hole injection from the p-type AlGaN into the n-type ZnO. Significant emission up to 500 K is observed indicating possible applications in harsh environments.
DOI
10.1557/PROC-798-Y3.9
Citation Information
D. M. Bagnall, Ya I. Alivov, E. V. Kalinina, David C. Look, et al.. "ZnO/AlGaN Ultraviolet Light Emitting Diodes" MRS Proceedings Vol. 798 (2004) p. 41 ISSN: 1946-4274 Available at: http://works.bepress.com/david_look/369/
Presented at the 2003 MRS Fall Meeting, Boston, MA.
Copyright © Materials Research Society 2004.