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Native Point Defects at ZnO Surfaces, Interfaces and Bulk Films
physica status solidi (c)
  • Leonard J. Brillson
  • Yufeng Dong
  • Filip Tuomisto
  • B. G. Svensson
  • A. Yu. Kuznetsov
  • Daniel R. Doutt
  • Howard L. Mosbacker
  • G. Cantwell
  • J. Zhang
  • J. J. Song
  • Zhaoqiang Fang, Wright State University - Main Campus
  • David C. Look, Wright State University - Main Campus
Document Type
Article
Publication Date
7-1-2012
Abstract

The impact of electronically-active native point defects on ZnO optoelectronic technologies at the nanoscale is only now being explored. We are able to address the impact of these defects on Schottky barrier formation and doping using a combination of depth-resolved and scanned probe techniques. We clearly identify the optical transitions and energies of VZn and VZn clusters, Ga on Zn site donors, Li on Zn sites, the effects of different annealing methods on their spatial distributions in ion-implanted as well as Ga grown-in ZnO, and how VZn, VZn clusters, and VO complexes contribute to near- and sub-surface carrier density. These results reveal the interplay between ZnO electronic defects, polarity, and surface nanostructure. Overall, the influence of native point defects on doping, Schottky barriers, and transport point to new ways for controlling these properties (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

DOI
10.1002/pssc.201100538
Citation Information
Leonard J. Brillson, Yufeng Dong, Filip Tuomisto, B. G. Svensson, et al.. "Native Point Defects at ZnO Surfaces, Interfaces and Bulk Films" physica status solidi (c) Vol. 9 Iss. 7 (2012) p. 1566 - 1569 ISSN: 1862-6351
Available at: http://works.bepress.com/david_look/335/