Skip to main content
Article
Shallow Donor Generation in ZnO by Remote Hydrogen Plasma
Journal of Electronic Materials
  • David C. Look, Wright State University - Main Campus
  • Yuri M. Strzhemechny
  • Howard L. Mosbacker
  • Steven H. Goss
  • Donald C. Reynolds
  • Cole W. Litton
  • Nelson Y. Garces
  • Nancy C. Giles
  • Shigeru Niki
  • Leonard J. Brillson
Document Type
Article
Publication Date
1-1-2005
Abstract

We investigate the effects of a remote hydrogen-plasma treatment on Hall parameters as well as on the bound exciton (BEx) photoluminescence (PL) for a variety of ZnO single crystals: bulk air-annealed, Li-doped, and epitaxially grown on sapphire. We present transport and spectroscopic evidence in favor of the hypothesis that hydrogen behaves as a shallow donor rather than a compensating center in ZnO. Specifically, we show that H-plasma-induced increases in 14 luminescence (photon energy: -3.363 eV at 4 K) correlate with increases in free-carrier concentrations from Hall-effect measurements.

DOI
10.1007/s11664-005-0118-1
Citation Information
David C. Look, Yuri M. Strzhemechny, Howard L. Mosbacker, Steven H. Goss, et al.. "Shallow Donor Generation in ZnO by Remote Hydrogen Plasma" Journal of Electronic Materials Vol. 34 Iss. 4 (2005) p. 399 - 403 ISSN: 0361-5235
Available at: http://works.bepress.com/david_look/301/