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Article
Deep Centers in Undoped Semi-insulating InP
Journal of Electronic Materials
  • Z-Q. Fang
  • David C. Look, Wright State University - Main Campus
  • M. Uchida
  • K. Kainosho
  • O. Oda
Document Type
Article
Publication Date
1-1-1998
Abstract

Undoped semi-insulating (SI) InP samples, subjected to one-step and multi-step wafer annealing, and lightly and normally Fe-doped SI InP samples without annealing have been characterized by thermally stimulated current (TSC) spectroscopy. A dominant deep center at 0.63 eV is found in all samples and is undoubtedly due to iron. Two prominent TSC traps, T-b (0.44 eV) and T-d (0.33 eV), found in undoped SI InP, are thought to be related to the phosphorus antisite P-In, and traps at low temperatures, like T-e* (0.19 eV), to the phosphrus vacancy V-P.

DOI
10.1007/s11664-998-0152-x
Citation Information
Z-Q. Fang, David C. Look, M. Uchida, K. Kainosho, et al.. "Deep Centers in Undoped Semi-insulating InP" Journal of Electronic Materials Vol. 27 Iss. 10 (1998) p. L68 - L71 ISSN: 0361-5235
Available at: http://works.bepress.com/david_look/287/