
Article
On Hall Scattering Factors for Holes in GaAs
Journal of Applied Physics
Document Type
Article
Publication Date
8-1-1996
Disciplines
Abstract
Hall scattering factors for electrons and holes in molecular beam epitaxial GaAs layers have been determined by comparing carrier concentrations measured by the Hall effect with those measured by the electrochemical capacitance–voltage technique. The conclusion is that both the electron and hole scattering factors are near unity for n ranging from 2×1016 to 7×1017 cm−3, and p ranging from 5×1016 to 4×1019 cm−3. This conclusion is consistent with the present theory for electrons, but not with that for holes.
DOI
10.1063/1.363007
Citation Information
David C. Look, C. E. Stutz, J. R. Sizelove and K. R. Evans. "On Hall Scattering Factors for Holes in GaAs" Journal of Applied Physics Vol. 80 Iss. 3 (1996) p. 1913 - 1915 ISSN: 0021-8979 Available at: http://works.bepress.com/david_look/17/
Copyright © 1996, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in the Journal of Applied Physics 80.3, and may be found at http://jap.aip.org/resource/1/japiau/v80/i3/p1913_s1