"Depth Measurement of Doped Semiconductors Using the Hall Technique" by G. C. DeSalvo

Selected Works of David C. Look

Article

Depth Measurement of Doped Semiconductors Using the Hall Technique

Journal of Applied Physics

G. C. DeSalvo
David C. Look, Wright State University - Main Campus
Christopher A. Bozada
J. L. Ebel

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Document Type

Article

Publication Date

1-1-1997

Disciplines

Physical Sciences and Mathematics and
Physics

Comments

Copyright © 1997, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in the Journal of Applied Physics 81.1, and may be found at http://jap.aip.org/resource/1/japiau/v81/i1/p281_s1

DOI

10.1063/1.363846

Citation Information

G. C. DeSalvo, David C. Look, Christopher A. Bozada and J. L. Ebel. "Depth Measurement of Doped Semiconductors Using the Hall Technique" Journal of Applied Physics Vol. 81 Iss. 1 (1997) p. 281 - 284 ISSN: 0021-8979
Available at: http://works.bepress.com/david_look/151/