Article
Unpinning of GaAs Surface Fermi Level by 200 Degrees C Molecular Beam Epitaxial Layer
Applied Physics Letters
Document Type
Article
Publication Date
12-1-1990
Disciplines
Abstract
Previous attempts to passivate the n‐type (100)GaAs surface have significantly reduced only the surface recombination centers, but not the surface acceptors which pin the Fermi level. Here we show that a 100 Å molecular beam epitaxial layer grown at 200 °C reduces the effective surface potential energy − eϕs from 0.70 to 0.17 eV, nearly eliminates light sensitivity, and permits nonalloyed ohmic contacts. After a 10 min, 450 °C anneal, − eϕs increases only to 0.22 eV.
DOI
10.1063/1.104110
Citation Information
David C. Look, C. E. Stutz and K. R. Evans. "Unpinning of GaAs Surface Fermi Level by 200 Degrees C Molecular Beam Epitaxial Layer" Applied Physics Letters Vol. 57 Iss. 24 (1990) p. 2570 - 2572 ISSN: 0003-6951 Available at: http://works.bepress.com/david_look/101/
Copyright © 1990, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters 57.24, and may be found at http://apl.aip.org/resource/1/applab/v57/i24/p2570_s1