Skip to main content
Micromagnetic modeling of the effects of stress on magnetic properties
Journal of Applied Physics
  • B. Zhu, Iowa State University
  • Chester C.H. Lo, Iowa State University
  • S. J. Lee, Iowa State University
  • David C. Jiles, Iowa State University
Document Type
Publication Date
A micromagnetic model has been developed for investigating the effect of stress on the magnetic properties of thin films. This effect has been implemented by including the magnetoelastic energy term into the Landau–Lifshitz–Gilbert equation. Magnetization curves of a nickelfilm were calculated under both tensile and compressive stresses of various magnitudes applied along the field direction. The modeling results show that coercivity increased with increasing compressive stress while remanence decreased with increasing tensile stress. The results are in agreement with the experimental data in the literature and can be interpreted in terms of the effects of the applied stress on the irreversible rotation of magnetic moments during magnetization reversal under an applied field.

The following article appeared in Journal of Applied Physics 89 (2001): 7009 and may be found at

Copyright 2001 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Copyright Owner
American Institute of Physics
File Format
Citation Information
B. Zhu, Chester C.H. Lo, S. J. Lee and David C. Jiles. "Micromagnetic modeling of the effects of stress on magnetic properties" Journal of Applied Physics Vol. 89 Iss. 11 (2001) p. 7009 - 7011
Available at: