Skip to main content
Emission Source Microscopy Technique for EMI Source Localization
IEEE Transactions on Electromagnetic Compatibility
  • Pratik Maheshwari
  • Hamed Kajbaf
  • Victor Khilkevich, Missouri University of Science and Technology
  • David Pommerenke, Missouri University of Science and Technology

For large, complex systems with multiple sources at the same frequency, localizing the sources of radiation often proves difficult. This paper presents an emission source microscopy (ESM) technique derived from synthetic aperture radar (SAR) to localize radiating sources on a PCB. Near-field scanning provides limited information about the components contributing to far-field radiation. This paper presents the source localization methodology, supported by simulation and measurement results. After localizing the sources, the far-field contribution and the total radiated power from each individual source can be estimated. The results show that the proposed method can distinguish between multiple radiating sources on a complex PCB.

Electrical and Computer Engineering
Research Center/Lab(s)
Electromagnetic Compatibility (EMC) Laboratory
Keywords and Phrases
  • Polychlorinated biphenyls,
  • Far-field radiation,
  • Limited information,
  • Microscopy technique,
  • Near-field scanning,
  • Radiating sources,
  • Simulations and measurements,
  • Source localization,
  • Total radiated power,
  • Synthetic aperture radar,
  • Electromagnetic interference (EMI),
  • emission source microscopy
Document Type
Article - Journal
Document Version
File Type
© 2016 Institute of Electrical and Electronics Engineers (IEEE), All rights reserved.
Publication Date
Citation Information
Pratik Maheshwari, Hamed Kajbaf, Victor Khilkevich and David Pommerenke. "Emission Source Microscopy Technique for EMI Source Localization" IEEE Transactions on Electromagnetic Compatibility Vol. 58 Iss. 3 (2016) p. 729 - 737 ISSN: 0018-9375
Available at: