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Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition
Applied Physics Letters
  • Ravi L. Hadimani, Iowa State University
  • Joao H. B. Silva, Universidade do Porto
  • Andre M. Pereira, Imperial College
  • Devo L. Schlagel, Iowa State University
  • Thomas A. Lograsso, Iowa State University
  • Yang Ren, Argonne National Laboratory
  • David C. Jiles, Iowa State University
  • Joao P. Araújo, Universidade do Porto
Document Type
Article
Publication Version
Published Version
Publication Date
1-1-2015
DOI
10.1063/1.4906056
Abstract
Magnetic refrigeration based on the magnetocaloric effect is one of the best alternatives to compete with vapor-compression technology. Despite being already in its technology transfer stage, there is still room for optimization, namely, on the magnetic responses of the magnetocaloric material. In parallel, the demand for different magnetostrictive materials has been greatly enhanced due to the wide and innovative range of technologies that emerged in the last years (from structural evaluation to straintronics fields). In particular, the Gd5(Six Ge1−x)4 compounds are a family of well-known alloys that present both giant magnetocaloric and colossal magnetostriction effects. Despite their remarkable properties, very few reports have been dedicated to the nanostructuring of these materials: here, we report a ∼800 nm Gd5Si2.7Ge 1.3 thin film. The magnetic and structural investigation revealed that the film undergoes a first order magnetostructural transition and as a consequence exhibits large magnetocaloric effect (−ΔSmMAX ∼ 8.83 J kg−1 K−1, ΔH = 5T) and giant thermal expansion (12000 p.p.m). The thin filmpresents a broader magnetic response in comparison with the bulk compound, which results in a beneficial magnetic hysteresis reduction. The ΔSmMAX exhibited by the Gd5(Si,Ge)4 thin filmmakes it a promising candidate for micro/nano magnetic refrigeration area.
Comments

The following article appeared in Appl. Phys. Lett. 106, 032402 (2015) and may be found at http://dx.doi.org/10.1063/1.4906056.

Rights
Copyright 2015 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
Copyright Owner
American Institute of Physics
Language
en
File Format
application/pdf
Citation Information
Ravi L. Hadimani, Joao H. B. Silva, Andre M. Pereira, Devo L. Schlagel, et al.. "Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition" Applied Physics Letters Vol. 106 Iss. 3 (2015) p. 032402
Available at: http://works.bepress.com/d_l_schlagel/119/