Electron-Beam-Generated Plasmas for Materials ProcessingSurface and Coatings Technology
AbstractThe results of investigations aimed at characterizing pulsed, electron-beam-produced plasmas for use in materials processing applications are discussed. In situ diagnostics of the bulk plasma and at the plasma/surface interface are reported for plasmas produced in Ar, N2, and mixtures thereof. Langmuir probes were employed to determine the local electron temperature, plasma density, and plasma potential within the plasma, while ion energy analysis and mass spectrometry were used to interrogate the ion flux at an electrode located adjacent to the plasma. The results illustrate the unique capabilities of electron-beam-produced plasmas and the various parameters available to optimize operating conditions for applications such as nitriding, etching, and thin film deposition.
CopyrightCopyright © 2004, Elsevier
Citation InformationScott G. Walton, Christopher Muratore, Darrin Leonhardt, Richard F. Fernsler, et al.. "Electron-Beam-Generated Plasmas for Materials Processing" Surface and Coatings Technology Vol. 186 Iss. 1-2 (2004)
Available at: http://works.bepress.com/christopher-muratore/46/