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Article
Electron-Beam-Generated Plasmas for Materials Processing
Surface and Coatings Technology
  • Scott G. Walton, Naval Research Laboratory
  • Christopher Muratore, University of Dayton
  • Darrin Leonhardt, Naval Research Laboratory
  • Richard F. Fernsler, Naval Research Laboratory
  • David D. Blackwell, Naval Research Laboratory
  • Robert A. Meger, Naval Research Laboratory
Document Type
Article
Publication Date
8-1-2004
Abstract
The results of investigations aimed at characterizing pulsed, electron-beam-produced plasmas for use in materials processing applications are discussed. In situ diagnostics of the bulk plasma and at the plasma/surface interface are reported for plasmas produced in Ar, N2, and mixtures thereof. Langmuir probes were employed to determine the local electron temperature, plasma density, and plasma potential within the plasma, while ion energy analysis and mass spectrometry were used to interrogate the ion flux at an electrode located adjacent to the plasma. The results illustrate the unique capabilities of electron-beam-produced plasmas and the various parameters available to optimize operating conditions for applications such as nitriding, etching, and thin film deposition.
Inclusive pages
40–46
ISBN/ISSN
0257-8972
Comments

Permission documentation is on file.

Publisher
Elsevier
Peer Reviewed
Yes
Citation Information
Scott G. Walton, Christopher Muratore, Darrin Leonhardt, Richard F. Fernsler, et al.. "Electron-Beam-Generated Plasmas for Materials Processing" Surface and Coatings Technology Vol. 186 Iss. 1-2 (2004)
Available at: http://works.bepress.com/christopher-muratore/46/