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Article
Control of Plasma Flux Composition Incident on TiN Films during reactive Magnetron Sputtering and the Effect on Film Microstructure
Journal of Vacuum Science & Technology A
  • Christopher Muratore, University of Dayton
  • Scott G. Walton, Naval Research Laboratory
  • Darrin Leonhardt, Naval Research Laboratory
  • Richard F. Fernsler, Naval Research Laboratory
Document Type
Article
Publication Date
1-1-2006
Abstract
A hybrid plasma enhanced physical vapor deposition (PEPVD) system consisting of an unbalanced dc magnetron and a pulsed electron beam-produced plasma was used to deposit reactively sputtered titanium nitride thin films. The system allowed for control of the magnitudes of the ion and neutral flux, in addition to the type of nitrogen ions (atomic or molecular) that comprised the flux. For all deposition experiments, the magnitude of the ion flux incident on the substrate was held constant, but the composition of the total flux was varied. X-ray diffraction and atomic force microscopy showed that crystallographic texture and surface morphology of the films were affected by the plasma flux composition during growth.
Inclusive pages
25-29
ISBN/ISSN
0734-2101
Document Version
Published Version
Comments

This document is provided for download in compliance with the publisher's policy on self-archiving. Permission documentation is on file.

Publisher
AIP Publishing
Peer Reviewed
Yes
Citation Information
Christopher Muratore, Scott G. Walton, Darrin Leonhardt and Richard F. Fernsler. "Control of Plasma Flux Composition Incident on TiN Films during reactive Magnetron Sputtering and the Effect on Film Microstructure" Journal of Vacuum Science & Technology A Vol. 24 Iss. 1 (2006)
Available at: http://works.bepress.com/christopher-muratore/13/